PHI GENESIS, a united model of PHI’s multi-functional scanning XPS instruments and was designed for automation and simplified operation.
The “PHI GENESIS” XPS is a new product that combines the core “GENESIS” of the PHI surface analysis instruments, which has a 50-year tradition of advanced automation and reduced analysis time, with expandability, and offers overwhelming basic performance in a compact housing.
The “PHI GENESIS” XPS provides high-speed, high-sensitivity, and overwhelming micro XPS analysis performance with automated multi-sample analysis with automatic sample exchange. A high-sensitivity analyzer with an improved counting rate also contributes to high performance. To date, ULVAC-PHI and Physical Electronics USA, a subsidiary of ULVAC-PHI, have developed various world-first XPS analysis technologies including scanning micro XPS and HAXPES (hard x-ray photoelectron spectroscopy), fully automated robotics XPS analysis, full-automatic insulator neutralization analysis, depth profiling of organic materials using cluster etching ion gun. All of these technologies are incorporated into a single instrument, making it possible to provide state-of-the-art XPS analysis technology for all kinds of materials, including metals, semiconductors, ceramics, and organic materials.
Another novel feature of PHI GENESIS is a new software package designed for ease of use and designed for all levels of users, from surface analysis beginners to well-trained scientists, from manufacturing to cutting-edge research and development. We have also prepared several options that allow customers to perform advanced analyses that previously required sophisticated analytical equipment such as a large synchrotron in a typical laboratory environment.